Development

A qubit is patterned with production EUV lithography

development2026-05-26

Claim

imec fabricated the first quantum dot qubit using High-NA EUV lithography, patterning gate gaps of barely 6 nanometers and pulling quantum hardware onto the same roadmap as next-generation AI processors.

Reported metric: 6 nm gate gaps

Reporting date: 2026-05-26 (not necessarily the event date)

Sources

Attribution and reporting linked by this record; links do not imply independent verification.

Welcome to May 26, 2026 (theinnermostloop.substack.com)

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Welcome to May 26, 2026

Actor

imec

Evidence for

Referenced by

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Citation formatCitation text

A qubit is patterned with production EUV lithography
Innermost Loop KB — secondary record
Reporting date: 2026-05-26
KB permalink: https://nicholsn.github.io/innermost-loop-kb/developments/2026-05-26-a-qubit-patterned-with-high-na-euv
Claim: imec fabricated the first quantum dot qubit using High-NA EUV lithography, patterning gate gaps of barely 6 nanometers and pulling quantum hardware onto the same roadmap as next-generation AI processors.
Attributed sources:
- Welcome to May 26, 2026 — https://theinnermostloop.substack.com/p/welcome-to-may-26-2026
This citation does not imply independent verification of linked-source claims.

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